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3

Effects of STI-fill thickness on the CMP process defects

Year:
2004
Language:
english
File:
PDF, 406 KB
english, 2004
15

Chemical mechanical polishing of Ba0.6Sr0.4TiO3 film prepared by sol–gel method

Year:
2004
Language:
english
File:
PDF, 327 KB
english, 2004
17

Effects of oxidant additives for exact selectivity control of W- and Ti-CMP process

Year:
2005
Language:
english
File:
PDF, 2.69 MB
english, 2005
26

Surface planarization of ZnO thin film for optoelectronic applications

Year:
2009
Language:
english
File:
PDF, 543 KB
english, 2009
31

Effects of different oxidizers on the W-CMP performance

Year:
2005
Language:
english
File:
PDF, 262 KB
english, 2005
32

Application of tungsten slurry for copper-chemical mechanical polishing

Year:
2005
Language:
english
File:
PDF, 334 KB
english, 2005
39

CMP properties and fabrication of OLED using MEH-PPV

Year:
2008
Language:
english
File:
PDF, 268 KB
english, 2008
40

Optical properties of GaSe:Er3+single crystals

Year:
1996
Language:
english
File:
PDF, 184 KB
english, 1996
41

Nested balancedN-ary designs

Year:
1995
Language:
english
File:
PDF, 339 KB
english, 1995
43

Chemical mechanical polishing of PZT thin films for FRAM applications

Year:
2006
Language:
english
File:
PDF, 447 KB
english, 2006